Normal incidence collector for LPP sources with integrated debris mitigation
Metadata only
Date
2010Type
- Conference Paper
ETH Bibliography
yes
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Publication status
publishedExternal links
Editor
Book title
Extreme ultraviolet (EUV) lithography : 22-25 February 2010, San Jose, California, United StatesVolume
Pages / Article No.
Publisher
SPIEEvent
Subject
EUVL; LPP; Debris mitigation; Thermal deformationOrganisational unit
03548 - Abhari, Reza S. / Abhari, Reza S.
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ETH Bibliography
yes
Altmetrics