Low-Temperature Wet Conformal Nickel Silicide Deposition for Transistor Technology through an Organometallic Approach
Publication status
publishedExternal links
Journal / series
ACS Applied Materials & InterfacesVolume
Pages / Article No.
Publisher
American Chemical SocietySubject
Nanoparticle; Nickel silicide; One-pot synthesis; Organometallic approach; Semiconductor; Surface investigationOrganisational unit
03430 - Zenobi, Renato / Zenobi, Renato
03872 - Copéret, Christophe / Copéret, Christophe
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